Semiconductor Precursors / Liquid Sources |
Liquid Source
Vaporization Control System
The compact point of use
liquid vaporizer / injection valve, can be used to replace the
bubbler or baking system for a wide range of vacuum coating applications.
Different models can be used
in conjunction with either a liquid mass flow meter or a high
temperature mass flow controller. |
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View:
Liquid
VC series
Liquid
and carrier gas MI series
PDF
direct liquid injection system datasheet
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- Compact-1/5 the Size of Previous Models,
considerably smaller than conventual baking or bubbler systems.
- Fast, Complete Vaporization allowing
for liquid delivery much closer to the point of use, reducing the
risk of condensation and the need for long heated lines.
- Installation Flexible
- Suitable for Semiconductor Films, such
as LPCVD, MCVD, TEOS, TMPO, TMOA, TiCl4, MOCVD, PECVD, SACVD, HMDSO etc.
- Suitable for the Next Generation of
Semiconductor Materials, such as Thin Ferroelectric Films, Ba, Ta,
Ti, TiCl4, SiCl4
and more.
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Other applications include SiO2 thin film,
Silicon Nitride, H2O water vaporisation for fuel cell applications, |