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The HORIBA Group has developed a comprehensive range of advanced analytical instruments and monitors for improving process yield and wafer quality such as oxide film growth or deposition, etching processes, wafer cleaning and final tests: Reticle/Mask inspection system for Lithography process – wet cleaning - POU-Concentration monitors
for FEOL & BEOL e.g.: SC-1 – SC-2 – SPM – HF/EG – BHF – DHF – Low concentration DHF – FPM – SHF – Polymer removal - etc, Multiplexing systems including Fab automation and automatic spiking control systems - IN-LINE Particle Sensor PLCA-821 – PFA-Conductivity Meter - IN-LINE Dissolved Ozone Monitor – Metal-free, fast response Resistivity Meter – Slurry particle distribution analyzer – IN-LINE Trace Gas Monitors for CO, CO2, CH4 – FT-IR Analyzer for PFC`s, VOC`s monitoring in Environment and process, ambient particle counters - Particle-free Liquid Flowmeters – Silica in Ultrapure water monitor – Fluoride in waste water monitor.
HoribaSTEC
Products Include:
MR/MG Digital Mass Flow Controller: SEC-Z500 series; DeviceNet Mass Flow Controller:
SEC-Z10D series; Digital Mass Flow Controller: SEC-V100D series; Compact Mass Flow Controller: SEC-G100 series, Backside Wafer Cooling System: GR-100 series; Auto
Pressure Regulator: UR-7300 series; Exhaust Controller: EC series; Residual Gas Analyzer:
MICROPOLETM System, Capacitance Manometer: VG series; Liquid Mass Flow Controller:
LV-F series; Liquid Direct Injection: MI/MV/VC series; Liquid Source Controller: LSC-A100
series; Liquid Source Auto Recharge System LU-A100 series; In-line Gas Monitor: IR-150 series; Precision Film Flow Meter:
SF/VP series; Configuration Soft.
Highlight:
We are pleased to inform you, that “STEC Inc.” has changed its name to “HORIBA STEC, Co. Ltd.” as of July 01, 2004. We introduce the new type Mass Flow Controller, Liquid Source Controller, Delivery System, RGA, Capacitance Manometer etc.
HORIBA JOBIN YVON
Exhibiting with HORIBA , THIN FILM OPTICAL CHARACTERIZATION:
For research and quality control: PZ2000*, combination of 3λ laser ellipsometry and UV reflectometry, UVISEL, high precision spectroscopic ellipsometers from DUV to NIR,
Fully automated systems for thin film production control: UT-300, 300 mm automatic
Spectroscopic ellipsometer for advanced thin film measurement applications, PQ Ruby*,
200 – 100 mm automatic laser ellipsometer. (*Formerly Philips Analytical Laser Ellipsometry).
THIN FILM PROCESS CONTROL: DigiCPM, PLASMASCOPE, MultiCPM: Advanced Process Control Platform using in-situ OES CCD and Interferometry for plasma diagnosis,
endpoint detection, fault detection and chamber health monitoring, multichamber monitoring and multisensor capabilities.
Please contact
semi.hil@horiba.com for further information |