Reticle and Mask Particle Detection System
PR-PD3
Outline
Featuring a high net working rate
and stability over the long term, the HORIBA PD Series has attained a
solid reputation in semiconductor fabrication plants. Redesigned in a
compact package, the PR-PD3 inherits high-performance features such
as a simple conveyance system for stable long-term operation, high
throughput, reliable optics, and the ability to counter erroneous
detection. While attaining a compactness approximately one half its
predecessor, the PR-PD2, it also boasts low running cost.
With a detection sensitivity of
0.5 µm, it is very versatile. The new PR-PD3 offers simplicity
and yet meets wide ranging needs in applications involving the
measurement of particles on reticles and masks.
Main Features
Compact design 1/2 of predecessor
The compact design boasts a
footprint one half that of the PR-PD2. Taking up much less space, the
PR-PD3 can be arranged freely, even with the addition of an operation
unit (option).
Low maintenance and operating costs
Maintenance and operating costs
have been reduced by using a highly economical He-Ne laser and simply
designed inspection loader/stage unit.
Effective function for
countering erroneous detection
The PR-PD3 is equipped with both
a polarized differential function for coarse patterns and a low-pass
difference function for fine patterns. Utilizing these two methods,
erroneous detection can be effectively countered in OPC patterns,
etc., that possess both characteristics.