Reticle and Mask Particle Detection System
PR-PD2
Outline
Introducing Horiba's PR-PD2, 0.35
micron reticle and mask inspection system for foreign particle
detection. This system fulfills the needs of constantly diversifying
lithographic and masking processes which demand ways of detecting the
minutest of foreign particles. With the ability to inspect reticles
and masks that are covered with a pellicle, you have the option of
inspecting foreign particles on pattern, glass or pellicle surfaces.
What's more, detection errors are minimized with a pattern
discrimination which has been enhanced to 1.0 µm/1.0 µm.
Main Features
0.35 µm detection
sensitivity, 93% detection rate.
Easy operation with flexible inspection menu.
Automatic loading of up to 10 reticles directly from reticle cases in a multi-stage sorter.
It is possible to obtain direct observations from both the reticle and mask surfaces (glass surface and pattern surface.)
Particles mapped on MS Windows NT, convenient data management for reporting.
Reduce inspection errors using the New Signal Process Method.